TEMAHf

Tetrakis(ethylmethylamido)hafnium(IV)

Application : DRAM & Flash Dielectric

반도체 DRAM의 Capacitor 제조공정에서 사용.
ALD 공정을 통한 HfO2 박막 증착의 용도로 사용.

Chemical Name : TEMAHf [Tetrakis(ethylmethylamido)hafnium(IV)]

Formula : C12H32HfN4

Molecular Weight : 410.90 g/mol

Boiling Point : 288 ℃

Vapor pressure : 0.004 torr / 20℃

Density : 1.324 g/mL

Phase at 25℃ : Colorless to pale yellow liquid